Ultrapure water is the lifeblood of high-end manufacturing. Ultrapure water equipment with stable resistivity of 18.25MΩ·cm has become an essential configuration for semiconductors, biomedicine, new energy, precision electronics and other industries. As an export brand focusing on high-end water treatment, Baihuipu has become a main supplier of Chinese ultrapure water equipment exported to the United States relying on UL certification, full-process independent R&D, stable water output and rich overseas cases, providing one-stop ultrapure water solutions for North American high-end manufacturing.
The U.S. market has the world’s strictest requirements for safety standards, material compliance and water stability of ultrapure water equipment. All series of Baihuipu ultrapure water equipment exported to the United States have passed UL certification, complying with UL 399 safety standards and ANSI/NSF drinking water material requirements. All indicators such as electrical safety, leakage protection, high temperature resistance and anti-leakage meet the standards, and can be directly cleared and put into use without secondary rectification. The equipment adopts double-stage RO + EDI + fine polishing process, equipped with TOC removal, particle control and sterile circulation modules. The effluent meets the strict requirements of SEMI, GMP, FDA, suitable for chip manufacturing, biomedicine, laboratory analysis and other high-precision scenarios.
In terms of overseas cases, Baihuipu has provided stable ultrapure water systems for enterprises in many parts of the United States:
Semiconductor wafer factory in California: 200T/H ultrapure water system, resistivity 18.25MΩ·cm, TOC＜3ppb, helping to improve yield;
Biomedical base in Texas: medical-grade ultrapure water equipment, complying with GMP sterile requirements, used for water for injection and reagent preparation;
New energy factory in Chicago: 10-50T/H ultrapure water station, stably supplying water for lithium battery pole piece cleaning and electrolyte preparation.
